Preparation and characterisation of ZnO:Ga films deposited on polyimide substrate by r.f. magnetron sputtering

被引：0

作者：

Li, Sumin ^{[1
]}

Zhao, Yutao ^{[1
]}

Zhang, Zhao ^{[1
]}

机构：

[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Jiangsu, Peoples R China

来源：

INTERNATIONAL JOURNAL OF MATERIALS & PRODUCT TECHNOLOGY | 2008年 / 31卷 / 2-4期

关键词：

magnetron sputtering; ZnO : Ga film; flexible substrate; electrical and optical properties;

D O I：

10.1504/IJMPT.2008.018030

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Gallium-doped Zinc Oxide (GZO) thin films have been deposited onto Polyimide (PI) substrate by r.f. magnetron sputtering. The effects of the sputtering argon pressure, r.f. power, target-substrate distance, negative substrate bias on the electrical, structural, morphological proper-ties and the growth rate of film are presented. The best results were obtained for a distance of 70 mm, argon sputtering pressure of 0. 1 Pa, r.f. power of 100 W and the negative substrate bias of 40 V, where a resistivity of 9.4 x 10(-)4 Omega cm was achieved. The transmittance in the visible range exceeded 78%.

引用

页码：326 / 338

页数：13

共 10 条

[1]

CALLITY BD, 1978, ELEMENTS XRAY DIFFRA, P284

[2] Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates [J].

Danson, N ;

Safi, I ;

Hall, GW ;

Howson, RP .

SURFACE & COATINGS TECHNOLOGY, 1998, 99 (1-2) :147-160

[3] Criteria for choosing transparent conductors [J].

Gordon, RG .

MRS BULLETIN, 2000, 25 (08) :52-57

[4] ZnO:Ga conducting-films grown by DC arc-discharge ionplating [J].

Hirasawa, H ;

Yoshida, M ;

Nakamura, S ;

Suzuki, Y ;

Okada, S ;

Kondo, K .

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2001, 67 (1-4) :231-236

[5] Characteristics of c-axis oriented large grain ZnO films prepared by low-pressure MO-CVD method [J].

Kashiwaba, Y ;

Sugawara, K ;

Haga, K ;

Watanabe, H ;

Zhang, BP ;

Segawa, Y .

THIN SOLID FILMS, 2002, 411 (01) :87-90

[6] Ga-doped ZnO films grown on GaN templates by plasma-assisted molecular-beam epitaxy [J].

Ko, HJ ;

Chen, YF ;

Hong, SK ;

Wenisch, H ;

Yao, T ;

Look, DC .

APPLIED PHYSICS LETTERS, 2000, 77 (23) :3761-3763

[7] Highly oriented and conducting ZnO:Ga layers grown by chemical spray pyrolysis [J].

Reddy, KTR ;

Reddy, TBS ;

Forbes, I ;

Miles, RW .

SURFACE & COATINGS TECHNOLOGY, 2002, 151 (151-152) :110-113

[8] ELECTRICAL AND OPTICAL-PROPERTIES OF TIN OXIDE-FILMS DOPED WITH F AND (SB+F) [J].

SHANTHI, E ;

BANERJEE, A ;

DUTTA, V ;

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1615-1621

[9] Micro-textured milky ZnO:Ga thin films fabricated by pulsed laser deposition using second-harmonic-generation of Nd:YAG laser [J].

Suzuki, A ;

Matsushita, T ;

Aoki, T ;

Yoneyama, Y ;

Okuda, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (1AB) :L71-L73

[10] TRANSPARENT CONDUCTING ZNO FILMS DEPOSITED BY ION-BEAM-ASSISTED REACTIVE DEPOSITION [J].

ZHANG, DH ;

BRODIE, DE .

THIN SOLID FILMS, 1992, 213 (01) :109-112

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