Fictive temperature measurement of alumino-silicate glasses using IR spectroscopy

被引:17
作者
Fujita, S
Sakamoto, A
Tomozawa, M [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[2] Nippon Elect Glass Co Ltd, Tech Div, Otsu, Shiga 5208639, Japan
关键词
D O I
10.1016/j.jnoncrysol.2003.09.025
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A simple IR reflection method was used in a previous study to determine the fictive temperature of silica glasses and a soda-lime glass. The IR method is based upon the fact that the silica structural band of a glass takes a unique wavenumber at a particular fictive temperature. When this method was applied to an alumino-silicate glass in this study, however, the IR reflection peak wavenumber of the glass surface was found to be strongly affected by the reaction of the glass with water vapor in the atmosphere. Still, it was possible to measure the fictive temperature of the alumino-silicate glass using IR spectroscopy by taking an IR reflection of the bulk sample after eliminating the surface layer affected by the reaction with water vapor. The IR peak wavenumber of the silica structural band decreased with increasing fictive temperature for the alumino-silicate glass, similar to silica glass. (C) 2003 Elsevier B.V. All rights reserved.
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页码:252 / 258
页数:7
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