Scalability of spin field programmable gate arrary: A reconfigurable architecture based on spin metal-oxide-semiconductor field effect transistor

被引:21
作者
Tanamoto, Tetsufumi [1 ]
Sugiyama, Hideyuki [1 ]
Inokuchi, Tomoaki [1 ]
Marukame, Takao [1 ]
Ishikawa, Mizue [1 ]
Ikegami, Kazutaka [1 ]
Saito, Yoshiaki [1 ]
机构
[1] Toshiba Corp 1, Adv LSI Technol Lab, Corp Res & Dev Ctr, Saiwai Ku, Kawasaki, Kanagawa 2128582, Japan
关键词
D O I
10.1063/1.3537923
中图分类号
O59 [应用物理学];
学科分类号
摘要
The scalability of a field programmable gate array (FPGA) using a spin metal-oxide-semiconductor field effect transistor (MOSFET) (spin FPGA) with a magnetocurrent (MC) ratio in the range of 100-1000% is discussed for the first time. The area and speed of million-gate spin FPGAs are numerically benchmarked with CMOS FPGA for 22, 32, and 45 nm technologies including a 20% transistor size variation. We show that the area is reduced and the speed is increased in spin FPGA due to the nonvolatile memory function of spin MOSFET. (C) 2011 American Institute of Physics. [doi:10.1063/1.3537923]
引用
收藏
页数:3
相关论文
共 50 条
[41]   GaAs-based metal-oxide-semiconductor field-effect transistor with aluminum oxide gate insulator prepared in situ by MOCVD [J].
Kordos, P. ;
Fox, A. ;
Kudela, R. ;
Mikulics, M. ;
Stoklas, R. ;
Gregusova, D. .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2012, 27 (11)
[42]   Metal-oxide-semiconductor field effect transistor-control led field emission display [J].
Kim, IH ;
Lee, JD ;
Oh, CW ;
Park, JW ;
Park, BG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01) :519-522
[43]   A technique to measure spin-dependent trapping events at the metal-oxide-semiconductor field-effect transistor interface: Near zero field spin-dependent charge pumping [J].
Anders, M. A. ;
Lenahan, P. M. ;
Harmon, N. J. ;
Flatte, M. E. .
JOURNAL OF APPLIED PHYSICS, 2020, 128 (24)
[44]   Temperature effects of γ-irradiated metal-oxide-semiconductor field-effect-transistor [J].
Wang, Jian-Ping ;
Xu, Na-Jun ;
Zhang, Ting-Qing ;
Tang, Hua-Lian ;
Liu, Jia-Lu ;
Liu, Chuan-Yang ;
Yao, Yu-Juan ;
Peng, Hong-Lun ;
He, Bao-Ping ;
Zhang, Zheng-Xuan .
Wuli Xuebao/Acta Physica Sinica, 2000, 49 (07)
[45]   Temperature effects of γ-irradiated metal-oxide-semiconductor field-effect-transistor [J].
Wang, JP ;
Xu, NJ ;
Zhang, TQ ;
Tang, HL ;
Liu, JL ;
Liu, CY ;
Yao, YJ ;
Peng, HL ;
He, BP ;
Zhang, ZX .
ACTA PHYSICA SINICA, 2000, 49 (07) :1331-1334
[46]   A compact quantum correction model for symmetric double gate metal-oxide-semiconductor field-effect transistor [J].
Cho, Edward Namkyu ;
Shin, Yong Hyeon ;
Yun, Ilgu .
JOURNAL OF APPLIED PHYSICS, 2014, 116 (17)
[47]   AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistor with oxidized Ni as a gate insulator [J].
Oh, CS ;
Youn, CJ ;
Yang, GM ;
Lim, KY ;
Yang, JW .
APPLIED PHYSICS LETTERS, 2004, 85 (18) :4214-4216
[48]   The demonstration of the magnetic Ge metal-oxide-semiconductor field-effect transistor [J].
Liao, M. -H. ;
Huang, S. -C. .
AIP ADVANCES, 2015, 5 (02)
[49]   Ballistic quantum transport in a nanoscale metal-oxide-semiconductor field effect transistor [J].
Arora, Vijay K. ;
Tan, Michael L. P. ;
Saad, Ismail ;
Ismail, Razali .
APPLIED PHYSICS LETTERS, 2007, 91 (10)
[50]   Compact double-gate metal-oxide-semiconductor field effect transistor model for device/circuit optimization [J].
Sadachika, Norio ;
Murakami, Takahiro ;
Oka, Hideki ;
Tanabe, Ryon ;
Mattausch, Hans Juergen ;
Miura-Mattausch, Mitiko .
IEICE TRANSACTIONS ON ELECTRONICS, 2008, E91C (08) :1379-1381