This letter reports studies on highly strained and strain-compensated InGaAs quantum-well (QW) active diode lasers on GaAs substrates, fabricated by low-temperature (550 degreesC) metal-organic chemical vapor deposition (MOCVD) growth. Strain compensation of the (compressively strained) InCaAs QW is investigated by using either InGaP (tensile-strained) cladding layer or GaAsP (tensile-strained) barrier layers, High-performance lambda = 1.165 mum laser emission is achieved from InGaAs-GaAsP strain-compensated QW laser structures, with threshold current densities of 65 A/cm(2) for 1500-mum-cavity devices and transparency current densities of 50 A/cm(2). The use of GaAsP-barrier layers are also shown to significantly improve the internal quantum efficiency of the highly strained InCaAs-active laser structure. As a result, external differential quantum efficiencies of 56% are achieved for 500-mum-cavity length diode lasers.
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Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Asano, H
;
Wada, M
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Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Wada, M
;
Fukunaga, T
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Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Fukunaga, T
;
Hayakawa, T
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Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
机构:
Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USAUniv So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA
Choi, WJ
;
Dapkus, D
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机构:Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA
Dapkus, D
;
Jewell, JJ
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机构:Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA
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Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Asano, H
;
Wada, M
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机构:
Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Wada, M
;
Fukunaga, T
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机构:
Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
Fukunaga, T
;
Hayakawa, T
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机构:
Fuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, JapanFuji Photo Film Co Ltd, Miyanodai Technol Dev Ctr, Kaisei, Kanagawa 2588538, Japan
机构:
Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USAUniv So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA
Choi, WJ
;
Dapkus, D
论文数: 0引用数: 0
h-index: 0
机构:Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA
Dapkus, D
;
Jewell, JJ
论文数: 0引用数: 0
h-index: 0
机构:Univ So Calif, Dept Elect Engn Electrophys, Ctr Photon Technol, Los Angeles, CA 90089 USA