Electrochemical deposition of Co-Sb thin films on nanostructured gold

被引:14
作者
Vidu, Ruxandra [1 ]
Li, Simon [2 ]
Quach, Dat V. [2 ]
Stroeve, Pieter [2 ]
机构
[1] NanoRIS, Sacramento, CA USA
[2] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA
关键词
Thermoelectric; Electrochemical deposition; Cyclic voltammetry; Thin film; Skutterudite; Cobalt triantimonide; AU(100)/CD2+ INTERFACE; THERMOELECTRIC FIGURE; ELECTRODEPOSITION; COBALT; DIFFUSION; BEHAVIOR;
D O I
10.1007/s10800-012-0401-9
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrochemical behavior of the Co-Sb system on Au substrate during cyclic voltammetry and potentiostatic deposition was investigated. Electrochemical behavior of Co and Sb was studied and compared to the Co-Sb system. At a negative potential (-0.9 V vs. Ag/AgCl) the electrochemical behavior of this binary system was similar to that of individual Co and Sb combined. For more negative vertex potentials (e.g., -1.2 V vs. Ag/AgCl), results from cyclic voltammetry have shown the presence of a new compound different from Co and Sb which could only be detected at slow sweep rate. The deposition performed at constant potentials between -1.0 and -1.2 V have resulted in films that were made of CoSb3 and Sb as indicated by XRD. Surface film studied by SEM and EDS has shown morphological and compositional non-uniformities caused by hydrogen evolution.
引用
收藏
页码:333 / 339
页数:7
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