Graphene based chemical sensor fabrication by means of Focused Ion Beam

被引:2
作者
Polichetti, T. [1 ]
Miglietta, M. L. [1 ]
Nasti, I. [1 ]
La Ferrara, V. [1 ]
Massera, E. [1 ]
Di Francia, G. [1 ]
机构
[1] ENEA Port Res Ctr, I-80055 Naples, Italy
来源
EUROSENSORS XXIV CONFERENCE | 2010年 / 5卷
关键词
graphene; gas sensors; focused ion beam;
D O I
10.1016/j.proeng.2010.09.340
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Graphene is a material with surprising properties, that very recently aroused the attention of the scientific world for its potential application in different fields from electronics to sensors. To date, many works have been already published dealt with graphene-based sensor in which the preparation of the devices involved the use of some lithographic method. It is known, however, that typical nano-lithographic processes leave an uncontrolled residue on graphene. In this work we present a graphene based chemiresistor, where the electrode structure is realized by Ion Beam Induced Deposition technique; the current-voltage characteristics of such a device will be investigated in different environments. (C) 2010 Published by Elsevier Ltd.
引用
收藏
页码:1252 / 1255
页数:4
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