Construction of mini-ECRIS for the JAERI 400 kV ion implanter

被引：5

作者：

Saitoh, Y

Yokota, W

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 03期

关键词：

D O I：

10.1063/1.1146723

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A very compact 10 GHz ECRIS for production of medium-multiply charged ions was designed and manufactured in order to extend the beam energy from the 400 kV ion implanter at JAERI. To install the ion source at a high-voltage terminal where the available space and electric power feeding are limited, a magnetic field is formed only by permanent magnets (NdFeB), and a rf power up to 15 W is supplied by a transistor amplifier. The magnet measures 12 cm in length, and 3 cm and 11 cm in inner and outer diameter, respectively. The maximum mirror field is 5500 G and the total electric power consumption of the source is below 180 W. A beam current of 1.6 mu A was observed for Ar4+ in test operations. The design and the results of the first operation at a test bench are reported. (C) 1996 American Institute of Physics.

引用

页码：1174 / 1176

页数：3

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