Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties

被引:0
作者
Haydoura, M. [1 ]
Marlec, F. [1 ]
Le Paven, C. [1 ]
Benzerga, R. [1 ]
Le Gendre, L. [1 ]
Chevire, F. [2 ]
Tessier, F. [2 ]
Seveno, R. [3 ]
Sharaiha, A. [1 ]
机构
[1] Univ Rennes, CNRS, IETR UMR 6164, F-35042 Rennes, France
[2] Univ Rennes, CNRS, ISCR UMR 6226, F-35042 Rennes, France
[3] Univ Nantes, CNRS, IETR UMR 6164, F-44000 Nantes, France
关键词
Perovskite phase; TTB phase; Thin films; Crystallization; Dielectric characterization; Tunability; TUNABILITY;
D O I
10.1016/j.solidstatesciences.2021.106733
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Structural and dielectric properties of thin films produced by reactive radiofrequency sputtering of a (Sr2Ta2O7)(100-x) (La2Ti2O7)(x) target with x = 1.65 were studied. The chemical composition characterization shows Sr/Ta ratios ranging between 0.49 and 0.56, thus pointing out the deposition of strontium deficient films, belonging to the tetragonal tungsten bronze family. The highest permittivities and tunabilities, associated with the lowest dielectric losses, are obtained when films are pure and fully textured. This is achieved for a 900 nmthick film deposited at T-s = 850 degrees C: epsilon' = 116, tan delta = 0.007 and tunability T = 14.5% at 340 kV/cm and 100 kHz.
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页数:8
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