Two-dimensional transition-metal dichalcogenides such as MoS2 are promising channel materials for transistor scaling. Here, we report the performance and environmental effects on back-gated bi-layer MoS2 field-effect transistors. The devices exhibit Ohmic contacts with titanium at room temperature, on/off ratio higher than 10(7), and current saturation. Furthermore, we show that the devices are sensitive to oxygen and water in the ambient. Exposure to ambient dramatically reduces the on-state current by up to 2 orders of magnitude likely due to additional scattering centers from chemisorption on the defect sites of MoS2. We demonstrate that vacuum annealing can effectively remove the absorbates and reversibly recover the device performances. This method significantly reduces the large variations in MoS2 device caused by extrinsic factors. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3696045]
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
Sikes, K. J.
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Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
Jiang, Z.
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Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
Klima, M.
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Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
Fudenberg, G.
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Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
Hone, J.
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Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
Kim, P.
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Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
Stormer, H. L.
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Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
Novoselov, K. S.
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Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
Sikes, K. J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
Klima, M.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
Fudenberg, G.
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h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
Hone, J.
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h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
Kim, P.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
Novoselov, K. S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England