Dynamic low-temperature scanning force microscopy on nickel oxide (001)

被引：25
|
作者：
Allers, W. [1 ]
Langkat, S.
Wiesendanger, R.
机构：
[1] Univ Hamburg, Inst Appl Phys, D-20355 Hamburg, Germany
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2001年 / 72卷 / Suppl 1期
关键词：
PACS: 61.16.Ch; 68.35.Bs;
D O I：
10.1007/s003390100731
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present atomically resolved images of nickel oxide (001) obtained with low temperature non-contact atomic force microscopy. Using iron coated silicon cantilevers, it is possible to distinguish defects with a vertical resolution of less than 10 pm and to obtain atomic resolution across step edges on the upper and lower terrace within 1 nm of the edge. The noise level in these images could be reduced to approximate to 1.5 pm.
引用
收藏
页码：S27 / S30
页数：4
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