Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device

被引：9

作者：

Takahashi, H. ^{[1
]}

Osakabe, M. ^{[1
]}

Nagaoka, K. ^{[1
]}

Nakano, H. ^{[1
]}

Tokitani, M. ^{[1
]}

Fujii, K. ^{[2
]}

Murakami, S. ^{[3
]}

Takeiri, Y. ^{[1
]}

Seki, T. ^{[1
]}

Saito, K. ^{[1
]}

Kasahara, H. ^{[1
]}

Seki, R. ^{[1
]}

Kamio, S. ^{[1
]}

Masuzaki, S. ^{[1
]}

Mutoh, T. ^{[1
]}

机构：

[1] Natl Inst Nat Sci, Natl Inst Fus Sci, Toki, Gifu 5095292, Japan

[2] Kyoto Univ, Dept Mech Engn & Sci, Kyoto 6158540, Japan

[3] Kyoto Univ, Dept Nucl Engn, Kyoto 6068501, Japan

来源：

JOURNAL OF NUCLEAR MATERIALS | 2015年 / 463卷

关键词：

LHD;

D O I：

10.1016/j.jnucmat.2014.11.131

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperature T-i were observed. There was no difference in the attained central T-i of the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higher T-i plasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for high T-i plasma production. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：1100 / 1103

页数：4

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