Soluble Fullerene-Based n-Channel Organic Thin-Film Transistors Printed by Using a Polydimethylsiloxane Stamp

被引:8
|
作者
Horii, Yoshinori [1 ,2 ]
Ikawa, Mitsuhiro [1 ]
Chikamatsu, Masayuki [1 ]
Azumi, Reiko [1 ]
Kitagawa, Masahiko [2 ]
Konish, Hisatoshi [2 ]
Yase, Kiyoshi [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsukuba, Ibaraki 3058565, Japan
[2] Tottori Univ, Grad Sch Engn, Tottori 6808552, Japan
关键词
organic field-effect transistor; organic semiconductor; n-channel material; soluble fullerene derivative; polydimethylsiloxane stamp; transfer printing; self-assembled monolayer; complementary inverter; FIELD-EFFECT TRANSISTORS; SELF-ASSEMBLED MONOLAYERS; GATE DIELECTRICS; POLYMER; MOBILITY; SEMICONDUCTORS; C-60; FABRICATION; ELECTRODES; INSULATOR;
D O I
10.1021/am101193y
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic semiconducting materials. The stamping method was found to facilitate film transfer onto a gate insulator surface irrespective of its surface free energy. We used [6,6]-phenyl-C-61-butyric acid methyl ester (PCBM) and Coo-fused N-methylpyrrolidine-meta-dodecyl phenyl (C60MC12) as n-channel materials. The stamped thin-film transistors of C60MC12 achieved a high electron mobility of 0.39 cm(2)/(V s) and a current on-off ratio of 1 x 10(7). The mobility of the stamped C60MC12 thin-film transistors did not depend much on the surface free energy of the SiO2 gate insulator with and without surface treatment using a silane-coupling reagent. In particular, the stamped C60MC12 thin-film transistor exhibited a relatively high mobility of 0.1 cm(2)/(V s) on a high energy surface of untreated SiO2. In addition, a complementary inverter composed of an n-channel and a p-channel stamped thin-film transistor was demonstrated for the first time, which exhibits a maximum gain of 63 at a supply voltage of 50 V.
引用
收藏
页码:836 / 841
页数:6
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