Block copolymer surface reconstuction: A reversible route to nanoporous films

被引:173
作者
Xu, T
Stevens, J
Villa, JA
Goldbach, JT
Guarim, KW
Black, CT
Hawker, CJ
Russell, TR [1 ]
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Great Falls Middle Sch, Turners Falls, MA 01376 USA
[3] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[4] Lane Tech High Sch, Chicago, IL 60618 USA
[5] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
关键词
D O I
10.1002/adfm.200304374
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Thin films of block copolymers have been used as templated and scaffolds for the fabrication of arrays of nanostructured materials. In general, a chemical modification of the film or the removal of one of the components by photodegradative methods to required to produce a nanoporous film that serves as a template or scaffold. Here, however, the preferential interaction of one of the components with a solvent is shown to produce a reconstruction of the block copolymer film that, upon drying leads to the generation of a nanoporous template. The area density of the pores is identical to that of the original copolymer thin film. Since no chemical reactions occur, the process is fully reversible. Upon heating the copolymer film above its glass transition temperatures, mobility is imparted to the copolymer and the original copolymer film with orientated domains is recovered. The film reconstruction significantly simplifies the generation of nanoporous templates.
引用
收藏
页码:698 / 702
页数:5
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