Two-Photon Lithography of Sub-Wavelength Metallic Structures in a Polymer Matrix

被引：67

作者：

Shukla, Shobha ^{[2
]}

Furlani, Edward P.

Vidal, Xavier

Swihart, Mark T. ^{[3
]}

Prasad, Paras N. ^{[1
]}

机构：

[1] SUNY Buffalo, Inst Lasers Photon & Biophoton, Buffalo, NY 14260 USA

[2] SUNY Buffalo, Dept Elect Engn, Inst Lasers Photon & Biophoton, Buffalo, NY 14260 USA

[3] SUNY Buffalo, Dept Chem Engn, Inst Lasers Photon & Biophoton, Buffalo, NY 14260 USA

来源：

ADVANCED MATERIALS | 2010年 / 22卷 / 33期

关键词：

OPTICAL-DATA STORAGE; DIFFRACTION LIMIT; MICROSTRUCTURES; PHOTOREDUCTION; MICROFABRICATION; METAMATERIALS; NANOPARTICLES; PHOTON;

D O I：

10.1002/adma.201000059

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A novel method for fabricating metallic nanostructures with sub-wavelength resolution in a polymer using simultaneous two-photon initiated reduction of a metal salt and polymerization of a negative photoresist is demonstrated. Gold nanoparticle-doped lines as narrow as 200 nm are fabricated. The dependence of line-width on laser intensity and scan speed are captured well by an analytical model. We create functional gratings and planar chiral elements, characterize their optical properties, and model their electromagnetic response.

引用

页码：3695 / +

页数：6

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