Deposition and characterization of low-density carbon nanotube networks on CMOS-compatible platform

被引:0
|
作者
Singh, Rohitkumar S. [1 ,2 ]
Takagi, K. [2 ]
Aoki, T. [2 ]
Moon, J. [2 ]
Neo, Y. [2 ]
Iwata, F. [2 ]
Mimura, H. [2 ]
Moraru, D. [2 ]
机构
[1] Shizuoka Univ, Grad Sch Sci & Technol, Shizuoka, Japan
[2] Shizuoka Univ, Res Inst Elect, Shizuoka, Japan
来源
2022 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW) | 2022年
关键词
Semiconductor; Carbon Nanotubes; inkjet printing; CMOS-compatible platform; silicon; HIGH-SPEED;
D O I
10.1109/SNW56633.2022.9889063
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Carbon nanotubes (CNTs) are one alternative building block for the new generation of electronics. One of the critical challenges is placing semiconducting CNTs as the active channel in a device configuration, while maintaining compatibility with Si-technology processes. In this work, a CMOS-compatible platform was fabricated in a first stage (as nanoscale gaps in Al electrodes on Si/SiO2 surfaces) and, in a second stage, CNTs were deposited using an inkjet printing system. By process optimization, devices containing local networks (arrays) of just a few CNTs contributing to transport can be formed. As a proof-of-concept, we also demonstrate the capability of applying an AFM-manipulation technique to modify the CNT network. This study can open a door to advanced fabrication capabilities for CNT-based transistors on a CMOS-compatible platform.
引用
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页数:2
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