Hole drilling of glass substrates with a CO2 laser

被引：26

作者：

Ogura, H

Yoshida, Y

机构：

[1] Matsushita Elect Ind Co Ltd, Tama Ku, Kanagawa 2148501, Japan

[2] Toyo Univ, Kawagoe, Saitama 3508585, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 5A期

关键词：

CO2; laser; hole drilling; synthetic quartz; Pyrex glass; soda-lime glass;

D O I：

10.1143/JJAP.42.2881

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A technique for hole drilling of glass substrates with a pulsed CO2 laser has been developed. With respect to laser machinability, we have compared three application in glass substrates, synthetic quartz, Pyrex glass and soda lime glass for single-laser-pulse (SLP) drilling. Although the drilling speeds for each glass are similar, there is a difference in the occurrence of the pileup around the hole, and we have determined that synthetic quartz is excellent for laser processing. Moreover, we have examined hole processing of synthetic quartz substrates by single and multiple-laser-pulse (MLP) drilling. Consequently, by the MLP hole-shaping technique, we can control the taper angle of a through hole, and decrease the height coefficient of the pileup around the hole in synthetic quartz, which is not possible in SLP drilling.

引用

页码：2881 / 2886

页数：6

共 11 条

[1]

BAKER HJ, 1999, P INT FOR ADV HIGH P, P1

[2] Three-dimensional microdrilling of glass by multiphoton process and chemical etching [J].

Kondo, Y ;

Qiu, J ;

Mitsuyu, T ;

Hirao, K ;

Yoko, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (10A) :L1146-L1148

[3]

KOYAMA T, 2001, P SOC PHOTO-OPT INS, V4426, P162

[4]

Li X., 2000, Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308), P271, DOI 10.1109/MEMSYS.2000.838528

[5] High density electrical feedthrough fabricated by deep reactive ion etching of Pyrex glass [J].

Li, XH ;

Abe, T ;

Liu, YX ;

Esashi, M .

14TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2001, :98-101

[6]

NAGAI H, 1999, REIZA PUROSESU GIJYU, P172

[7]

OGURA H, 1999, MWE 99 MICR WORKSH D, P357

[8]

Takahashi K, 2001, IEICE T ELECTRON, VE84C, P1506

[9]

Takahashi K, 1999, IEICE T ELECTRON, VE82C, P2029

[10]

YABE T, 2002, J IEE JAPAN, V122, P76

← 1 2 →