Physical Sputtering of a Copper Anode of a Planar Magnetron by a Beam of Accelerated Argon Ions with an Energy of 1-10 keV

被引：1

作者：

Semenov, A. P. ^{[1
]}

Semenova, I. A. ^{[1
]}

Tsyrenov, D. B-D ^{[1
]}

Nikolaev, E. O. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Mat Sci, Siberian Branch, Ulan Ude 670047, Russia

来源：

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2021年 / 64卷 / 04期

关键词：

VACUUM-ARC; FILMS; DISCHARGE; GAS;

D O I：

10.1134/S0020441221040242

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

During the approximation of kinetic energy transfer in collision cascades, a numerical estimate of the sputtering coefficient of the copper anode of a magnetron is considered. It has been shown that when a 1-10 keV ion beam is injected into a magnetron, the sputtering coefficient of the copper anode of the magnetron is three to six atoms per incident ion, which makes it possible to introduce and control impurities, in particular copper, under conditions of synthesis of superhard TiN-Cu coatings by reactive magnetron sputtering and directed action on the nanocrystalline structure of the coatings with high accuracy and in small fractional ratios (units of at %).

引用

页码：539 / 541

页数：3