Precision synthesis of a fluorinated polyhedral oligomeric silsesquioxane-terminated polymer and surface characterization of its blend film with poly(methyl methacrylate)

被引:121
作者
Koh, K
Sugiyama, S
Morinaga, T
Ohno, K
Tsujii, Y
Fukuda, T [1 ]
Yamahiro, M
Iijima, T
Oikawa, H
Watanabe, K
Miyashita, T
机构
[1] Kyoto Univ, Inst Chem Res, Uji, Kyoto 6110011, Japan
[2] Chisso Petrochem Corp, Goi Res Ctr, Ichihara, Chiba 2908551, Japan
[3] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1021/ma047636l
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Incompletely condensed, fluorinated polyhedral oligomeric silsesquioxane with the highly reactive group of trisodium silanolate was used for the synthesis of an initiator for atom transfer radical polymerization. The initiator was applied to solution polymerization of methyl methacrylate (MMA) in the presence of a copper complex. The polymerization proceeded in a living fashion, providing tadpole-shaped polymers with an "inorganic head" of polyhedral oligomeric silsesquioxane (POSS) and an "organic tail" of well-defined PMMA. A blend film composed of the tadpole-shaped polymer and a matrix PMMA was annealed at 180degreesC for 5 days and then analyzed by neutron reflectometry, X-ray photoelectron spectroscopy, and contact angle measurement. These analyses revealed that the tadpole-shaped polymer was preferentially populated at the air/polymer interface, and the outermost layer of the film was almost completely covered by the POSS heads. This was mainly due to the low surface free energy of the fluorinated POSS moiety. Owing to this unique structure, the blend film showed strong resistance against Ar+ ion etching, despite the overall POSS content was only 2 wt %.
引用
收藏
页码:1264 / 1270
页数:7
相关论文
共 60 条
[1]   Surface segregation in blends of polystyrene and perfluorohexane double end capped polystyrene studied by static SIMS, ISS, and XPS [J].
Affrossman, S ;
Bertrand, P ;
Hartshorne, M ;
Kiff, T ;
Leonard, D ;
Pethrick, RA ;
Richards, RW .
MACROMOLECULES, 1996, 29 (16) :5432-5437
[2]   SILSESQUIOXANES [J].
BANEY, RH ;
ITOH, M ;
SAKAKIBARA, A ;
SUZUKI, T .
CHEMICAL REVIEWS, 1995, 95 (05) :1409-1430
[3]   Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography [J].
Bellas, V ;
Tegou, E ;
Raptis, I ;
Gogolides, E ;
Argitis, P ;
Iatrou, H ;
Hadjichristidis, N ;
Sarantopoulou, E ;
Cefalas, AC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2902-2908
[4]   A LATTICE MONTE-CARLO STUDY OF LONG-CHAIN CONFORMATIONS AT SOLID POLYMER MELT INTERFACES [J].
BITSANIS, IA ;
TENBRINKE, G .
JOURNAL OF CHEMICAL PHYSICS, 1993, 99 (04) :3100-3111
[5]   Organic/inorganic hybrid epoxy nanocomposites from aminophenylsilsesquioxanes [J].
Choi, J ;
Kim, SG ;
Laine, RM .
MACROMOLECULES, 2004, 37 (01) :99-109
[6]  
Choi J., 2001, J AM CHEM SOC, V123, P11240
[7]   Organic/inorganic nanocomposite star polymers via atom transfer radical polymerization of methyl methacrylate using octafunctional silsesquioxane cores [J].
Costa, ROR ;
Vasconcelos, WL ;
Tamaki, R ;
Laine, RM .
MACROMOLECULES, 2001, 34 (16) :5398-5407
[8]  
FEAST WJ, 1993, POLYM SURFACE INTERF, V2
[9]   The persistent radical effect in ''living'' radical polymerization [J].
Fischer, H .
MACROMOLECULES, 1997, 30 (19) :5666-5672
[10]   Styrene-butadiene-styrene triblock copolymers modified with polyhedral oligomeric silsesquioxanes [J].
Fu, BX ;
Lee, A ;
Haddad, TS .
MACROMOLECULES, 2004, 37 (14) :5211-5218