High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation

被引：69
作者：
Jun, Kimin [1 ,2 ]
Lee, Yun Seog [2 ]
Buonassisi, Tonio [2 ]
Jacobson, Joseph M. [1 ,2 ]
机构：
[1] MIT, Media Lab, Ctr Bits & Atoms, Cambridge, MA 02139 USA
[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2012年 / 51卷 / 02期
关键词：
electrochemistry; photoelectrodes; semiconductors; silicon; water oxidation; PHOTOELECTROCHEMICAL HYDROGEN-PRODUCTION; OXYGEN-EVOLVING CATALYST; ELECTRODES; SI; PHOTOELECTROLYSIS;
D O I：
10.1002/anie.201104367
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Silicon splits: The application of silicon to water oxidation is limited due to unfavorable interface properties. However, these can be circumvented by using a high-performance silicon photoanode with a catalytically active iron oxide thin film (see picture). This approach results in photocurrents as high as 17mA cm -2 under 1sun and zero overpotential conditions. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：423 / 427
页数：5
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