NiO/Ce0.8Gd0.2O1.9-x (NiO/CGO) films with thicknesses between 150 and 800 nm were prepared by spray pyrolysis. Average grain sizes were 5-260 nm after annealing in air at 600-1200 degrees C. After reduction, the Ni/CGO cermet microstructures were stable up to temperatures of 600 degrees C for grain sizes of 53 nm. Nickel coarsening was observed for films with smaller grains. The development of a rigid CGO grain network helped to prevent nickel growth. The electrical conductivities of the films were comparable to state-of-the-art Ni-YSZ cermets and reached 3000 S cm(-1) at 600 degrees C. Films with stable microstructures showed no degradation in electrical conductivity over 1400 h at 570 degrees C and upon thermal cycling. A transition from three-dimensional metallic Percolation of cermets with small grains and large thickness to two-dimensional percolation for films with grain sizes in the range of the layer thickness was observed. (C) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
机构:
Energy & Nucl Res Inst IPEN, POB 11049, BR-05422970 Sao Paulo, SP, BrazilEnergy & Nucl Res Inst IPEN, POB 11049, BR-05422970 Sao Paulo, SP, Brazil
Batista, R. M.
Ferreira, A. M. D. C.
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Univ S Paulo, Inst Chem, Ave Prof Lineu Prestes 748, BR-05508000 Sao Paulo, SP, BrazilEnergy & Nucl Res Inst IPEN, POB 11049, BR-05422970 Sao Paulo, SP, Brazil
Ferreira, A. M. D. C.
Muccillo, E. N. S.
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Energy & Nucl Res Inst IPEN, POB 11049, BR-05422970 Sao Paulo, SP, Brazil
Ctr Mat Sci & Technol, Ave Prof Lineu Prestes,2242,Cidade Univ, BR-05508000 Sao Paulo, SP, BrazilEnergy & Nucl Res Inst IPEN, POB 11049, BR-05422970 Sao Paulo, SP, Brazil
机构:
ETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, SwitzerlandETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
Muecke, Ulrich P.
Akiba, Kojiro
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Tokyo Inst Technol, Dept Met & Ceram Sci, Meguro Ku, Tokyo 1528552, JapanETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
Akiba, Kojiro
Infortuna, Anna
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ETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, SwitzerlandETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
Infortuna, Anna
Salkus, Tomas
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Vilnius Univ, Fac Phys, LT-10222 Vilnius, LithuaniaETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
Salkus, Tomas
Stus, Nataliya V.
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Kyiv Natal Taras Shevchenko Univ, Dept Chem, UA-01033 Kiev, UkraineETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
Stus, Nataliya V.
Gauckler, Ludwig J.
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ETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, SwitzerlandETH, Dept Mat Nonmet Inorgan Mat, Wolfgang Pauli Str 10, CH-8093 Zurich, Switzerland
机构:
Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USAUniv Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA
Jiang, Jun
Shen, Weida
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Univ Delaware, Dept Mech Engn, Newark, DE 19716 USAUniv Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA
Shen, Weida
Hertz, Joshua L.
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Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA
Univ Delaware, Dept Mech Engn, Newark, DE 19716 USAUniv Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA