X-ray lithography and its applications

被引：0
|
作者：
Tolfree, D [1 ]
机构：
[1] CCLRC,DARESBURY LAB,WARRINGTON,CHESHIRE,ENGLAND
来源：
MATERIALS WORLD | 1996年 / 4卷 / 04期
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：189 / 191
页数：3
相关论文
共 50 条
  • [21] X-ray lithography for microelectronics
    Smith, HI
    PHYSICA SCRIPTA, 1996, T61 : 26 - 31
  • [22] Nanometer X-ray lithography
    Proc SPIE Int Soc Opt Eng, (69-79):
  • [23] Application of a theory for generation of soft X-ray by storage rings and its use for X-ray lithography
    Minkov, D.
    Yamada, H.
    Toyosugi, N.
    Morita, M.
    Yamaguchi, T.
    SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2, 2007, 879 : 268 - +
  • [24] LASER PLASMA X-RAY SOURCE AND ITS APPLICATION TO LITHOGRAPHY
    TANAKA, KA
    ARITOME, H
    KANABE, T
    NAKATSUKA, M
    YAMANAKA, T
    NAKAI, S
    X-RAY INSTRUMENTATION IN MEDICINE AND BIOLOGY, PLASMA PHYSICS, ASTROPHYSICS, AND SYNCHROTRON RADIATION, 1989, 1140 : 350 - 357
  • [25] New achievements in X-ray optics - the X-ray lens and its applications
    Yan, YM
    He, YJ
    Ding, XL
    Chen, J
    Li, Y
    Wei, FZ
    Xie, JD
    Pan, QL
    Wang, DC
    PROGRESS IN NATURAL SCIENCE-MATERIALS INTERNATIONAL, 2001, 11 (02) : 87 - 93
  • [26] New achievements in X-ray optics - The X-ray lens and its applications
    Yan, Yiming
    He, Yejun
    Ding, Xunliang
    Chen, Jun
    Li, Yude
    Wei, Fuzhong
    Xie, Jindong
    Pan, Qiuli
    Wang, Dachun
    Progress in Natural Science, 2001, 11 (02) : 92 - 93
  • [27] Reflectivity test of X-ray mirrors for deep X-ray lithography
    V. Nazmov
    E. Reznikova
    A. Last
    M. Boerner
    J. Mohr
    Microsystem Technologies, 2008, 14 : 1299 - 1303
  • [28] FABRICATION OF CARBON MEMBRANE X-RAY MASK FOR X-RAY LITHOGRAPHY
    Noda, Daiji
    Takahashi, Naoki
    Tokuoka, Atsushi
    Katori, Megumi
    Hattori, Tadashi
    PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION (IMECE 2010), VOL 10, 2012, : 279 - 283
  • [29] Reflectivity test of X-ray mirrors for deep X-ray lithography
    Nazmov, V.
    Reznikova, E.
    Last, A.
    Boerner, M.
    Mohr, J.
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2008, 14 (9-11): : 1299 - 1303
  • [30] Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography
    Hirai, Y
    Hafizovic, S
    Matsuzuka, N
    Korvink, JG
    Tabata, O
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2006, 15 (01) : 159 - 168
12345