X-ray lithography and its applications

被引：0
|
作者：
Tolfree, D [1 ]
机构：
[1] CCLRC,DARESBURY LAB,WARRINGTON,CHESHIRE,ENGLAND
来源：
MATERIALS WORLD | 1996年 / 4卷 / 04期
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：189 / 191
页数：3
相关论文
共 50 条
  • [1] X-ray imaging: applications to patterning and lithography
    Cerrina, F
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (12) : R103 - R116
  • [2] X-RAY LITHOGRAPHY
    SULLIVAN, PA
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276
  • [3] X-RAY LITHOGRAPHY
    FEDER, R
    SPILLER, E
    TOPALIAN, J
    POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06): : 385 - 389
  • [4] X-RAY LITHOGRAPHY
    SMITH, HI
    FLANDERS, DC
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 : 61 - 65
  • [5] Reflective x-ray masks for x-ray lithography
    Chumak, V. S.
    Peredkov, S.
    Devizenko, A. Yu
    Kopylets, I. A.
    Pershyn, Yu P.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2024, 34 (04)
  • [6] X-ray lithography for 3D microfluidic applications
    Romanato, F
    Tormen, M
    Businaro, L
    Vaccari, L
    Stomeo, T
    Passaseo, A
    Di Fabrizio, E
    MICROELECTRONIC ENGINEERING, 2004, 73-4 : 870 - 875
  • [7] Indus-2 X-ray lithography beamline for X-ray optics and material science applications
    Dhamgaye, V. P.
    Lodha, G. S.
    SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 : 7 - 12
  • [8] Nanometer X-ray lithography
    Hartley, FT
    Malek, CK
    DEVICE AND PROCESS TECHNOLOGIES FOR MEMS AND MICROELECTRONICS, 1999, 3892 : 69 - 79
  • [9] X-RAY BEAMLINE SYSTEM FOR X-RAY LITHOGRAPHY.
    Eastman, D.E.
    Grobman, W.D.
    IBM technical disclosure bulletin, 1983, 25 (12): : 6415 - 6416
  • [10] Review of x-ray collimators for x-ray proximity lithography
    Lane, S
    Barbee, T
    Mrowka, S
    Maldonado, J
    EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES, 1999, 3767 : 172 - 182
12345