Field-effect transistors made from solution-grown two-dimensional tellurene

被引:719
作者
Wang, Yixiu [1 ]
Qiu, Gang [2 ,3 ]
Wang, Ruoxing [1 ]
Huang, Shouyuan [4 ]
Wang, Qingxiao [5 ]
Liu, Yuanyue [6 ,7 ,8 ]
Du, Yuchen [2 ,3 ]
Goddard, William A., III [6 ]
Kim, Moon J. [4 ]
Xu, Xianfan [3 ,4 ]
Ye, Peide D. [2 ,3 ]
Wu, Wenzhuo [1 ,3 ]
机构
[1] Purdue Univ, Sch Ind Engn, W Lafayette, IN 47907 USA
[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[3] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
[4] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
[5] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75083 USA
[6] CALTECH, Resnick Sustainabil Inst, Pasadena, CA 91125 USA
[7] CALTECH, Mat & Proc Simulat Ctr, Pasadena, CA 91125 USA
[8] Univ Texas Austin, Dept Mech Engn, Texas Mat Inst, Austin, TX 78712 USA
来源
NATURE ELECTRONICS | 2018年 / 1卷 / 04期
基金
美国国家科学基金会;
关键词
ELECTRONIC-PROPERTIES; TRIGONAL TELLURIUM; LATTICE-DYNAMICS; LAYER MOS2; NANOWIRES; SEMICONDUCTOR; CONDUCTIVITY; EXFOLIATION;
D O I
10.1038/s41928-018-0058-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reliable production of two-dimensional (2D) crystals is essential for the development of new technologies based on 2D materials. However, current synthesis methods suffer from a variety of drawbacks, including limitations in crystal size and stability. Here, we report the fabrication of large-area, high-quality 2D tellurium (tellurene) using a substrate-free solution process. Our approach can create crystals with process-tunable thickness, from a monolayer to tens of nanometres, and with lateral sizes of up to 100 mu m. The chiral-chain van der Waals structure of tellurene gives rise to strong in-plane anisotropic properties and large thickness-dependent shifts in Raman vibrational modes, which is not observed in other 2D layered materials. We also fabricate tellurene field-effect transistors, which exhibit air-stable performance at room temperature for over two months, on/off ratios on the order of 10(6), and field-effect mobilities of about 700 cm(2) V-1 s(-1). Furthermore, by scaling down the channel length and integrating with high-k dielectrics, transistors with a significant on-state current density of 1 A mm(-1) are demonstrated.
引用
收藏
页码:228 / 236
页数:9
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