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Field-effect transistors made from solution-grown two-dimensional tellurene
被引:717
|作者:
Wang, Yixiu
[1
]
Qiu, Gang
[2
,3
]
Wang, Ruoxing
[1
]
Huang, Shouyuan
[4
]
Wang, Qingxiao
[5
]
Liu, Yuanyue
[6
,7
,8
]
Du, Yuchen
[2
,3
]
Goddard, William A., III
[6
]
Kim, Moon J.
[4
]
Xu, Xianfan
[3
,4
]
Ye, Peide D.
[2
,3
]
Wu, Wenzhuo
[1
,3
]
机构:
[1] Purdue Univ, Sch Ind Engn, W Lafayette, IN 47907 USA
[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[3] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
[4] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
[5] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75083 USA
[6] CALTECH, Resnick Sustainabil Inst, Pasadena, CA 91125 USA
[7] CALTECH, Mat & Proc Simulat Ctr, Pasadena, CA 91125 USA
[8] Univ Texas Austin, Dept Mech Engn, Texas Mat Inst, Austin, TX 78712 USA
来源:
NATURE ELECTRONICS
|
2018年
/
1卷
/
04期
基金:
美国国家科学基金会;
关键词:
ELECTRONIC-PROPERTIES;
TRIGONAL TELLURIUM;
LATTICE-DYNAMICS;
LAYER MOS2;
NANOWIRES;
SEMICONDUCTOR;
CONDUCTIVITY;
EXFOLIATION;
D O I:
10.1038/s41928-018-0058-4
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The reliable production of two-dimensional (2D) crystals is essential for the development of new technologies based on 2D materials. However, current synthesis methods suffer from a variety of drawbacks, including limitations in crystal size and stability. Here, we report the fabrication of large-area, high-quality 2D tellurium (tellurene) using a substrate-free solution process. Our approach can create crystals with process-tunable thickness, from a monolayer to tens of nanometres, and with lateral sizes of up to 100 mu m. The chiral-chain van der Waals structure of tellurene gives rise to strong in-plane anisotropic properties and large thickness-dependent shifts in Raman vibrational modes, which is not observed in other 2D layered materials. We also fabricate tellurene field-effect transistors, which exhibit air-stable performance at room temperature for over two months, on/off ratios on the order of 10(6), and field-effect mobilities of about 700 cm(2) V-1 s(-1). Furthermore, by scaling down the channel length and integrating with high-k dielectrics, transistors with a significant on-state current density of 1 A mm(-1) are demonstrated.
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页码:228 / 236
页数:9
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