Enhancement of Ti-containing hydrogenated carbon (Ti-C:H) films by high-power plasma-sputtering

被引：7

作者：

Gwo, Jyh ^{[2
]}

Chu, Chun-Lin ^{[1
]}

Tsai, Ming-Jui ^{[3
]}

Lee, Shyong ^{[2
]}

机构：

[1] Natl Nano Device Labs, Hsinchu, Taiwan

[2] Natl Cent Univ, Dept Mech Engn, Chungli 32054, Taiwan

[3] Res Atom Energy Council, Inst Nucl Energy, Tao Yuan, Taiwan

来源：

APPLIED SURFACE SCIENCE | 2012年 / 258卷 / 08期

关键词：

High-power pulsed magnetron sputtering; Me-DLC; Diamond-like carbon; MECHANICAL-PROPERTIES; AMORPHOUS-CARBON; MAGNETRON; DEPOSITION; PARAMETERS; DISCHARGE; COATINGS; STEEL;

D O I：

10.1016/j.apsusc.2011.11.090

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ti-containing amorphous hydrogenated carbon (Ti-C:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C2H2 gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a Ti-Ti-CDLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of Ti-C:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3433 / 3437

页数：5

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