A fast and efficient approach to fabricate tarnish-resistant nanocrystalline Ag-Ge thin films by direct current electrodeposition

被引：6

作者：

Bahmani, E. ^{[1
]}

Zakeri, A. ^{[1
]}

Aghdam, A. Sabour Rouh ^{[1
]}

机构：

[1] Tarbiat Modares Univ, Dept Mat Engn, POB 14115-143, Tehran, Iran

来源：

MATERIALS LETTERS | 2020年 / 274卷

关键词：

Electrodeposition; Tarnish resistance; Silver-germanium alloy; Sulfidation; Nanocrystalline materials; Surfaces; SILVER;

D O I：

10.1016/j.matlet.2020.127991

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper, electrodeposition of nanocrystalline silver-germanium thin films was explored as a strategy to achieve high tarnish resistance compared to pure silver. Emphasis is placed on fabricating Ag-Ge films through a rapid and cost-effective technique. The electrodeposits were characterized by FESEM, EDS, AFM, ICP, and GIXRD. The tarnish resistance was performed by exposing films to thioacetamide (TAA) in a controlled test chamber and was studied by UV-visible spectroscopy. The results indicated that it was possible to co-electrodeposit thin films of Ag-Ge alloys from a cyanide-based electrolyte with improved tarnish resistance. The influence and role of Ge incorporation on the microstructure and tarnish protection were discussed. (C) 2020 Published by Elsevier B.V.

引用

页数：5