Heat transport monitoring in porous silicon by the photoacoustic technique

被引:0
|
作者
CruzOrca, A [1 ]
Delgadillo, I [1 ]
AlvaradoGil, JJ [1 ]
SanchezSinencio, F [1 ]
Vargas, H [1 ]
机构
[1] CINVESTAV IPN, IPN, DEPT FIS, MEXICO CITY 07000, DF, MEXICO
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A non-separation approach to determine the spark-processed porous silicon thermal parameters is presented. This thermal characterization was performed through application of the photoacoustic technique, in the open photoacoustic cell modality, in combination with compositional models for spark-processed porous silicon samples. This approach opens the possibility of performing the thermal characterization of other porous semiconductors.
引用
收藏
页码:S487 / S490
页数:4
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