Co film stretching induced by lattice mismatch and annealing: The role of Graphene

被引:2
作者
Carlomagno, I. [1 ]
Drnec, J. [2 ]
Vlaic, S. [3 ]
Vinogadrov, N. [4 ,5 ]
Carla, F. [2 ]
Isern, H. [2 ]
Meneghini, C. [1 ]
Felici, R. [6 ]
机构
[1] Univ Rome Tre, Dipartimento Sci, Rome, Italy
[2] ESRF, Grenoble, France
[3] LPEM UMR8213 CNRS ESPCI Paris Tech, Paris, France
[4] St Petersburg State Univ, St Petersburg, Russia
[5] Lund Univ, MAX Lab 4, Lund, Sweden
[6] SPIN CNR, Rome, Italy
关键词
Thin films; Graphene; Intercalationa; MAGNETIC TUNNEL-JUNCTION; INTERCALATION; ANISOTROPY;
D O I
10.1016/j.apsusc.2017.07.287
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin Co films intercalated between a Graphene capping layer and the Ir(111) surface are of interest for spintronics applications due to their peculiar magnetic properties and to their chemical stability. The structure, and then the magnetic properties, of the Co films depend on the intercalation process which is strongly influenced by the temperature, total amount of Cobalt and quality of the capping Graphene layer. In order to identify and disentangle the effects of these contributions, we report on the structural characterisation of four Co films as a function of thickness, annealing temperature, and Graphene capping. From the structural point of view, the deposition of Co on a hot Ir substrate mimics quite well the intercalation process proving the validity of the colander model describing the Graphene role during the process. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:22 / 26
页数:5
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