Avalanche-induced excess noise in polycrystalline silicon thin-film transistors

被引:4
作者
Dimitriadis, CA [1 ]
Kamarinos, G
Brini, J
Evangelou, EK
Gueorguiev, VK
机构
[1] Univ Thessaloniki, Dept Phys, GR-54006 Salonika, Greece
[2] ENSERG, LPCS, F-38016 Grenoble 1, France
[3] Univ Ioannina, Dept Phys, GR-45110 Ioannina, Greece
[4] Bulgarian Acad Sci, Inst Solid State Phys, BU-1784 Sofia, Bulgaria
关键词
D O I
10.1063/1.122966
中图分类号
O59 [应用物理学];
学科分类号
摘要
The low-frequency noise behavior of polycrystalline silicon thin-film transistors, operated in the avalanche multiplication region of the output characteristics, is investigated. The avalanche-induced current noise, originating from generation-recombination processes in the depletion region of the drain junction, can be described by the carrier number fluctuation model. Using a model for the excess noise in silicon-on-insulator metal-oxide-semiconductor field-effect transistors operated in the kink regime, an analytical expression for the avalanche-induced current noise is derived taking into account an exponential distribution of the gap states. Comparison of the experimental noise data with the theoretical model indicates that, in addition to the avalanche multiplication, hot-carrier effects contribute significantly to the current increase in the avalanche regime. (C) 1999 American Institute of Physics. [S0003-6951(99)05001-9].
引用
收藏
页码:108 / 110
页数:3
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