Process technique for improving the tuning range in MOS varactors

被引:1
|
作者
Kulkarni, JP [1 ]
Bhat, N [1 ]
机构
[1] Cypress Semicond Technol Ltd, Bangalore, Karnataka, India
来源
PROCEEDINGS OF THE IEEE INDICON 2004 | 2004年
关键词
RF CMOS; poly-silicon depletion effect; varactors; Q factor;
D O I
10.1109/INDICO.2004.1497813
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper presents a new technique to improve the tuning range of MOS varactors in conventional CMOS technology. Poly-silicon depletion effect is intentionally incorporated in the gate electrode of varactor. It is demonstrated that the tuning range Increases by 60% without degradation in Q factor. The process for the proposed poly-silicon depletion effect does not require any extra process steps, except the redefinition of the appropriate masks, making this technique compatible with current CMOS technology. An analytical model for this improvement is also discussed.
引用
收藏
页码:534 / 537
页数:4
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