Engineering nanostructured cell micropatterns on Ti6Al4V by selective ion-beam inhibition of pitting

被引：4
作者：
Lopez, R. [1 ,2 ,3 ]
Ynsa, M. D. [1 ,2 ,4 ]
de Pablo, P. J. [2 ,3 ]
Lim, F. [5 ]
Manso Silvan, M. [1 ,2 ]
机构：
[1] Univ Autonoma Madrid, Dept Fis Aplicada, E-28049 Madrid, Spain
[2] Univ Autonoma Madrid, Inst Ciencia Mat Nicolas Cabrera, E-28049 Madrid, Spain
[3] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[4] Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain
[5] Univ Autonoma Madrid, Dept Biol Mol, E-28049 Madrid, Spain
来源：
CORROSION SCIENCE | 2020年 / 167卷
关键词：
High energy ion beam implantation; Pitting; Ti6Al4V; Cell guidance; Olfactory ensheathing glia cells; SPINAL-CORD-INJURY; CORROSION-RESISTANCE; SURFACE; ALLOY; TI; BEHAVIOR;
D O I：
10.1016/j.corsci.2020.108528
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have modified Ti6A14V at the micro and nanoscale by using ion beam irradiation with 5 MeV Si+ ions through 1D micromasks. The passivation layer on irradiated areas inhibits hydrofluoric acid induced etching, leading to pitting contrasts. Surface microscopies and spectroscopies reveal that the nanotopographic modification correlates with a preferential titanium etching, and lead to dual surface free energy properties. The patterns are able to induce guidance of olfactory ensheathing glia cells, mainly through inhibition of adhesion on nanostructured areas, and could be attractive substrates for the induction of stimuli to neural cells under non voltaic polarization.
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页数：8
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