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- [3] The reaction of ozone and H2O2 in ammonium hydroxide (NH4OH) solutions and their reaction with silicon wafers CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING, 2000, 99 (36): : 288 - 295
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- [5] Reaction of ozone and H2O2 in NH4OH solutions and their reaction with silicon wafers Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2004, 43 (6 A): : 3335 - 3339
- [6] Rapid fabrication of silver microplates under an oxidative etching environment consisting of O2/Cl-, NH4OH/H2O2, and H2O2 CRYSTENGCOMM, 2015, 17 (29): : 5530 - 5537
- [9] CHEMICAL TREATMENT EFFECTS OF SI SURFACES IN NH4OH H2O2 H2O SOLUTIONS STUDIED BY SPECTROSCOPIC ELLIPSOMETRY JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (9A): : L1189 - L1191
- [10] Chemical treatment effects of Si surfaces in NH4OH:H2O2:H2O solutions studied by spectroscopic ellipsometry Japanese Journal of Applied Physics, Part 2: Letters, 1993, 32 (9 A):