Epitaxial directional growth of indium-doped tin oxide nanowire arrays

被引:127
|
作者
Nguyen, P
Ng, HT [1 ]
Kong, J
Cassell, AM
Quinn, R
Li, J
Han, J
McNeil, M
Meyyappan, M
机构
[1] NASA, Ames Res Ctr, Ctr Nanotechnol, Moffett Field, CA 94035 USA
[2] San Jose State Univ, Dept Chem Engn, San Jose, CA 95192 USA
[3] Eloret Corp, Sunnyvale, CA 94087 USA
关键词
D O I
10.1021/nl0342186
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this report, we show controlled in-situ doping of a single crystalline metal oxide nanowire, using indium-doped tin oxide (In-SnO2) as an example, during a heteroepitaxial growth process. Highly regular and high-density arrays of In-SnO2 nanowires, which demonstrate three-and four-fold growth symmetry, are obtained directly on optical sapphire substrates. Similar synthesis strategies, involving careful selection of desired growth conditions and smart manipulation of favorable thermodynamic properties, could be extended to production of various doped metal oxide nanowires.
引用
收藏
页码:925 / 928
页数:4
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