Microstructure and Hardness of Chromium Aluminum Nitride Coatings Deposited by Asymmetrical Bipolar Magnetron Sputtering

被引：0
|
作者：
Li Mingsheng [1 ]
Fan Yongzhong [1 ]
Zhang Shujuan [1 ]
Zhu Wen [1 ]
Duan Weiliang [1 ]
机构：
[1] Jiangxi Normal Univ Sci & Technol, Jiangxi Key Lab Surface Engn, Nanchang 330013, Peoples R China
来源：
RARE METAL MATERIALS AND ENGINEERING | 2010年 / 39卷
关键词：
asymmetrical bipolar magnetron sputtering; chromium aluminum nitride coatings; structure; hardness;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Chromium aluminum nitride coatings with different Al content were deposited using an asymmetrical bipolar magnetron sputtering method by adjusting the power of Cr target and Al target. Cr(0.95)Al(0.05)N, Cr(0.9)Al(0.1)N, Cr(0.83)Al(0.17)N and Cr(0.75)Al(0.25)N coatings were obtained and all of them exhibited the BlNaCl phase with preferred orientation of (220). The introduction of Al into the coating decreased the roughness and improved the density of the coatings and gave rise of the change of coating structure from columnar crystalline to equiaxed one. With the increasing Al content, the hardness of the (Cr, Al)N coatings increased first and then decreased. The hardness of Cr(0.83)Al(0.17)N coating got up to 33 GPa.
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收藏
页码：48 / 51
页数：4
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