III-V Nanowires-Extending a Narrowing Road

被引:82
作者
Wernersson, Lars-Erik [1 ]
Thelander, Claes [1 ]
Lind, Erik [1 ]
Samuelson, Lars [1 ]
机构
[1] Lund Univ, Solid State Phys NmC LU, S-22100 Lund, Sweden
基金
瑞典研究理事会;
关键词
Complementary metal-oxide-semiconductor (CMOS); nanotechnology; nanowire field-effect transistors (FETs); III-V metal-oxide-semiconductor field-effect transistors (MOSFETs); WRAP GATE TRANSISTORS; OPTICAL-PROPERTIES; HETEROSTRUCTURES; GROWTH; GAAS; ARRAYS; CAPACITANCE; GHZ; 1-D;
D O I
10.1109/JPROC.2010.2065211
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Semiconductor nanowires have attracted considerable attention during the last decade and are considered as an alternative path to extend the road for scaled semiconductor devices. The interest is motivated by the improved electrostatic control in the cylindrical geometry and the possibility to utilize heterostructures in transistor design. Currently, nanowire transistors have been realized both in III-Vs and in group IV materials employing top-down as well as bottom-up technologies. In this review, we give an overview of the field and, in particular, we summarize state-of-the-art for III-V nanowire devices. It is demonstrated that the growth and processing technologies are maturing and that devices with good transistor characteristics are being fabricated by a combined bottom-up and top-down approach. Also, the first radio-frequency (RF)-implementations are reviewed and discussed.
引用
收藏
页码:2047 / 2060
页数:14
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