Near-field optical lithography method for fabrication of the nanodimensional objects

被引：20

作者：

Dryakhlushin, VF ^{[1
]}

Klimov, AY ^{[1
]}

Rogov, VV ^{[1
]}

Vostokov, NV ^{[1
]}

机构：

[1] RAS, Inst Phys Microstruct, Nizhnii Novgorod 603950, Russia

来源：

APPLIED SURFACE SCIENCE | 2005年 / 248卷 / 1-4期

关键词：

scanning near-field optical microscopy; nanolithography;

D O I：

10.1016/j.apsusc.2005.03.081

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A new method of contact scanning near-field optical lithography has been developed to enable fabrication of elements with characteristic dimensions of 30-50 nm. The method involves the deposition of a thin-layer polymer-metal coating, the thermal destructive deformation of a top metal layer with a probe of scanning near-field optical microscope (SNOM), the transfer of the pattern through the polymer by using dry etching and the formation of various nanoelements through this prepared mask. The method is applicable to any material, e.g. metal, dielectric, light/heavy doped semiconductors for the formation of nanometre objects. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：200 / 203

页数：4

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