A Polarization-Sensitive Multiband Plasmonic Hot Electron Photodetector Based on Conformal MoS2

被引:8
作者
Li, Jialu [1 ,2 ]
Zhao, Yuan [1 ]
Tang, Linlong [2 ]
Nie, Changbin [2 ]
Wang, Jing [2 ]
Yao, Wei [2 ]
机构
[1] Harbin Inst Technol, Phys Dept, Harbin 150000, Heilongjiang, Peoples R China
[2] Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing 400714, Peoples R China
基金
中国国家自然科学基金;
关键词
Hot Electron; Surface Plasmons; MoS2; Grating; TRANSISTORS; PERFORMANCE; MONOLAYER; NANOPARTICLES; TRANSITION; GRAPHENE; ANTENNA; SILVER; ZNS;
D O I
10.1166/jnn.2019.16439
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We present an insulator-semiconductor-metal plasmonic hot-electron photodetector based on a grating structure that uses monolayer MoS2 as a semiconductor. Within the MoS2 bandgap wavelength, the choice of design can be used to increase the photocurrent via the enhanced electric field of surface plasmons. Beyond the bandgap, hot electrons generated by surface plasmons can contribute to the photocurrent, which overcomes the limitation of the semiconductor's bandgap. Using a finite element method simulation, we determined the optimal geometric configuration for the grating and metal parameters. Moreover, we compared our conformal structure with typical planar and metal gratings. The results show that our structure enables the maximum optical enhancement for the semiconductor and the highest utilization ratio of hot electrons among these three architectures. In contrast with a conventional metal-semiconductor-metal structure in which the net current is the difference between forward and backward currents, the proposed structure has only one layer of metal with unidirectional current, which can further enhance the net current and hence the responsivity.
引用
收藏
页码:213 / 219
页数:7
相关论文
共 44 条
  • [1] Nonradiative Plasmon Decay and Hot Carrier Dynamics: Effects of Phonons, Surfaces, and Geometry
    Brown, Ana M.
    Sundararaman, Ravishankar
    Narang, Prineha
    Goddard, William A., III
    Atwater, Harry A.
    [J]. ACS NANO, 2016, 10 (01) : 957 - 966
  • [2] Progress, Challenges, and Opportunities in Two-Dimensional Materials Beyond Graphene
    Butler, Sheneve Z.
    Hollen, Shawna M.
    Cao, Linyou
    Cui, Yi
    Gupta, Jay A.
    Gutierrez, Humberto R.
    Heinz, Tony F.
    Hong, Seung Sae
    Huang, Jiaxing
    Ismach, Ariel F.
    Johnston-Halperin, Ezekiel
    Kuno, Masaru
    Plashnitsa, Vladimir V.
    Robinson, Richard D.
    Ruoff, Rodney S.
    Salahuddin, Sayeef
    Shan, Jie
    Shi, Li
    Spencer, Michael G.
    Terrones, Mauricio
    Windl, Wolfgang
    Goldberger, Joshua E.
    [J]. ACS NANO, 2013, 7 (04) : 2898 - 2926
  • [3] Charge density wave, superconductivity, and anomalous metallic behavior in 2D transition metal dichalcogenides
    Castro Neto, AH
    [J]. PHYSICAL REVIEW LETTERS, 2001, 86 (19) : 4382 - 4385
  • [4] Hot-Electron Photodetection with a Plasmonic Nanostripe Antenna
    Chalabi, Hamidreza
    Schoen, David
    Brongersma, Mark L.
    [J]. NANO LETTERS, 2014, 14 (03) : 1374 - 1380
  • [5] A Surface Plasmon Enhanced Infrared Photodetector Based on InAs Quantum Dots
    Chang, Chun-Chieh
    Sharma, Yagya D.
    Kim, Yong-Sung
    Bur, Jim A.
    Shenoi, Rajeev V.
    Krishna, Sanjay
    Huang, Danhong
    Lin, Shawn-Yu
    [J]. NANO LETTERS, 2010, 10 (05) : 1704 - 1709
  • [6] Clavero C, 2014, NAT PHOTONICS, V8, P95, DOI [10.1038/NPHOTON.2013.238, 10.1038/nphoton.2013.238]
  • [7] Multiple-gate SOI MOSFETs
    Colinge, JP
    [J]. SOLID-STATE ELECTRONICS, 2004, 48 (06) : 897 - 905
  • [8] High Performance Multilayer MoS2 Transistors with Scandium Contacts
    Das, Saptarshi
    Chen, Hong-Yan
    Penumatcha, Ashish Verma
    Appenzeller, Joerg
    [J]. NANO LETTERS, 2013, 13 (01) : 100 - 105
  • [9] Investigating the Performance of Ultra-Sensitive Optical Sensor Using Plasmonic Nanoparticles
    Elrashidi, Ali
    [J]. NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2016, 8 (06) : 465 - 470
  • [10] Towards high-performance transistors and photodetectors with monolayer graphene through modified transfer and lithography process
    Ge, Bangtong
    Zhou, Dahua
    Zhang, Weiguo
    Feng, Shuanglong
    Sun, Lidong
    Shen, Jun
    [J]. MATERIALS EXPRESS, 2017, 7 (03) : 230 - 236