Effects of Mg accumulation on chemical and electronic properties of Mg-doped p-type GaN surface

被引:61
|
作者
Hashizume, T [1 ]
机构
[1] Hokkaido Univ, Res Ctr Integrated Quantum Elect, Sapporo, Hokkaido 0608628, Japan
关键词
D O I
10.1063/1.1580195
中图分类号
O59 [应用物理学];
学科分类号
摘要
Chemical and electronic properties of Mg-doped p-GaN surfaces were systematically investigated by x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). The doping density of Mg ranged from 3x10(19) to 9x10(19) cm(-3). The XPS and AES analyses revealed the accumulation of Mg for all the air-exposed and chemically treated p-GaN surfaces. The apparent density of Mg calculated from the XPS integrated intensity and the AES intensity was more than one order higher than the value in bulk determined by secondary ion mass spectroscopy. Mg accumulation as well as large amounts of oxides made up the disordered region on the p-GaN:Mg surfaces. Large surface band bending of 1.2-1.6 eV was found at the p-GaN surfaces even after treatment in KOH and NH4OH solutions, due to the existence of high-density surface states. It was found that electron cyclotron resonance assisted N-2 -plasma treatment at 300 degreesC for 1 min is very effective in removing such surface disordered regions and reducing surface band bending. (C) 2003 American Institute of Physics.
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页码:431 / 436
页数:6
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