V-band high-isolation CMOS T/R switch fabricated using 90-nm CMOS technology

被引:2
作者
Kuo, Chi-Shin [1 ]
Kuo, Hsin-Chih [1 ]
Chuang, Huey-Ru [1 ]
Chen, Chu-Yu [2 ]
Huang, Tzuen-Hsi
Huang, Guo-Wei [3 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Comp & Commun Engn, Tainan 701, Taiwan
[2] Natl Univ Tainan, Dept Elect Engn, Tainan 700, Taiwan
[3] Natl Nano Device Labs, Hsinchu 30078, Taiwan
关键词
V-band; T; R-switch; body floating; leakage cancellation; CMOS; SPDT SWITCH;
D O I
10.1002/mop.26768
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article presents a V-band high-isolation complementary metal-oxide semiconductor (CMOS) single-pole double-throw transmitter/receiver (T/R) switch fabricated with TSMC standard 90-nm 1P9M CMOS technology. A low insertion loss and high linearity are achieved using the body-floating technique. In addition, the leakage cancellation technique is used to increase the isolation between the transmitter and receiver ports. The measured results show the insertion loss from the transmitter port to the antenna port is less than 3.5 dB, and the isolation between the transmitter and receiver ports is higher than 28 dB from 57 to 64 GHz. At the center frequency of 60 GHz, the port isolation is higher than 34 dB. The switch isolation has also been measured under the large signal test which is not reported in the previous works. (C) 2012 Wiley Periodicals, Inc. Microwave Opt Technol Lett 54:11181123, 2012; View this article online at wileyonlinelibrary.com. DOI10.1002/mop.26768
引用
收藏
页码:1118 / 1123
页数:6
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