Dynamical Effects on Thermal Diffuse Scattering in Si 111 Bragg Reflection

被引：2

作者：

Mitsui, Takaya ^{[1
]}

Fujiwara, Kosuke ^{[1
]}

Imai, Yasuhiko ^{[2
]}

Yoda, Yoshitaka ^{[2
]}

机构：

[1] Natl Inst Quantum Sci & Technol, Sayo, Hyogo 6795148, Japan

[2] Japan Synchrotron Radiat Res Inst, Sayo, Hyogo 6795198, Japan

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 2022年 / 91卷 / 03期

基金：

日本学术振兴会;

关键词：

DIFFRACTION; CRYSTAL; RAYS;

D O I：

10.7566/JPSJ.91.035002

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Intensity variation on thermal diffuse scattering (TDS) in the Si 111 Bragg reflection was studied using a Fe-57 synchrotron Mossbauer source. The observed TDS diffraction curve showed an anomalous intensity variation depending on the X-ray incident angle. The variation was qualitatively explained by dynamical effects in the Si perfect crystal, that is the angular dependencies of the X-ray wave fields and extinction distance in the crystal.

引用

页数：2

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