Dynamical Effects on Thermal Diffuse Scattering in Si 111 Bragg Reflection

被引:2
|
作者
Mitsui, Takaya [1 ]
Fujiwara, Kosuke [1 ]
Imai, Yasuhiko [2 ]
Yoda, Yoshitaka [2 ]
机构
[1] Natl Inst Quantum Sci & Technol, Sayo, Hyogo 6795148, Japan
[2] Japan Synchrotron Radiat Res Inst, Sayo, Hyogo 6795198, Japan
基金
日本学术振兴会;
关键词
DIFFRACTION; CRYSTAL; RAYS;
D O I
10.7566/JPSJ.91.035002
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Intensity variation on thermal diffuse scattering (TDS) in the Si 111 Bragg reflection was studied using a Fe-57 synchrotron Mossbauer source. The observed TDS diffraction curve showed an anomalous intensity variation depending on the X-ray incident angle. The variation was qualitatively explained by dynamical effects in the Si perfect crystal, that is the angular dependencies of the X-ray wave fields and extinction distance in the crystal.
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页数:2
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