Antireflective Transparent Conductive Oxide Film Based on a Tapered Porous Nanostructure

被引：5

作者：

Choi, Kiwoon ^{[1
]}

Jung, Jaehoon ^{[1
]}

Kim, Jongyoung ^{[1
]}

Lee, Joonho ^{[1
]}

Lee, Han Sup ^{[2
]}

Kang, Il-Suk ^{[3
]}

机构：

[1] Next E&M Res Inst, Environm Res Ctr, 410 Jeongseojin Ro, Incheon 22689, South Korea

[2] Inha Univ, Dept Chem Engn, 100 Inha Ro, Incheon 22212, South Korea

[3] Korea Adv Inst Sci & Technol, Natl Nanofab Ctr, 291 Daehak Ro, Daejeon 34141, South Korea

来源：

MICROMACHINES | 2020年 / 11卷 / 02期

关键词：

antireflective film; transparent conductive oxide; nanostructure; LIGHT-EMITTING-DIODES; INDIUM-TIN-OXIDE; REFRACTIVE-INDEX; THIN-FILMS; ENHANCEMENT; SURFACE;

D O I：

10.3390/mi11020206

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

A new architecture for antireflection (AR) has been developed to break the trade-off between the optical transmittance and the electrical conduction impeding the performance of transparent conductive oxide (TCO) films. The tapered porous nanostructure with a complex continuous refractive index effectively eliminates reflections from the interfaces between air and the TCO and TCO and the substrate. Compared to the conventional TCO film, the AR TCO film exhibited the same electrical conduction, with an average transmittance of 88.7% in the 400-800 nm range, a 10.3% increase. The new AR TCO film is expected to improve the performance of various optoelectronic devices.

引用

页数：6

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