Fabrication of positively patterned conducting polymer microstructures via one-step electrodeposition

被引:31
作者
Zhou, F [1 ]
Chen, M [1 ]
Liu, WM [1 ]
Liu, JX [1 ]
Liu, ZL [1 ]
Mu, ZG [1 ]
机构
[1] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
关键词
D O I
10.1002/adma.200304466
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
One-step electrodeposition of pyrrole on octadecyltrichlorosilane- (OTS) patterned silicon wafers results in positively patterned polypyrrole (PPy) structures, i.e., PPy deposits on the OTS-covered area. In contrast, negative patterns are obtained on an indium. tin oxide surface. The Figure shows electrically isolated positive PPy microwires on a silicon wafer.
引用
收藏
页码:1367 / +
页数:5
相关论文
共 33 条
[1]   Hydrophobic protein-polypyrrole interactions: The role of van der Waals and Lewis acid-base forces as determined by contact angle measurements [J].
Azioune, A ;
Chehimi, MM ;
Miksa, B ;
Basinska, T ;
Slomkowski, S .
LANGMUIR, 2002, 18 (04) :1150-1156
[2]   High-performance plastic transistors fabricated by printing techniques [J].
Bao, ZN ;
Feng, Y ;
Dodabalapur, A ;
Raju, VR ;
Lovinger, AJ .
CHEMISTRY OF MATERIALS, 1997, 9 (06) :1299-&
[3]  
Beh WS, 1999, ADV MATER, V11, P1038, DOI 10.1002/(SICI)1521-4095(199908)11:12<1038::AID-ADMA1038>3.0.CO
[4]  
2-L
[5]  
Delamarche E, 2001, ADV MATER, V13, P1164
[6]   Self-assembly is not the only reaction possible between alkyltrichlorosilanes and surfaces: Monomolecular and oligomeric covalently attached layers of dichloro- and trichloroalkylsilanes on silicon [J].
Fadeev, AY ;
McCarthy, TJ .
LANGMUIR, 2000, 16 (18) :7268-7274
[7]   FABRICATION OF PATTERNED, ELECTRICALLY CONDUCTING POLYPYRROLE USING A SELF-ASSEMBLED MONOLAYER - A ROUTE TO ALL-ORGANIC CIRCUITS [J].
GORMAN, CB ;
BIEBUYCK, HA ;
WHITESIDES, GM .
CHEMISTRY OF MATERIALS, 1995, 7 (03) :526-529
[8]  
Granlund T, 2000, ADV MATER, V12, P269, DOI 10.1002/(SICI)1521-4095(200002)12:4<269::AID-ADMA269>3.0.CO
[9]  
2-5
[10]  
Holdcroft S, 2001, ADV MATER, V13, P1753, DOI 10.1002/1521-4095(200112)13:23<1753::AID-ADMA1753>3.0.CO