Electronic structures and stabilities of bilayer graphene doped with boron and nitrogen

被引:36
作者
Fujimoto, Yoshitaka [1 ]
Saito, Susumu [1 ,2 ,3 ]
机构
[1] Tokyo Inst Technol, Dept Phys, Meguro Ku, Tokyo 1528551, Japan
[2] Tokyo Inst Technol, Int Res Ctr Nanosci & Quantum Phys, Meguro Ku, Tokyo 1528551, Japan
[3] Tokyo Inst Technol, Mat Res Ctr Element Strategy, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
Density-functional theory; Bilayer graphene; Chemical doping; SCANNING-TUNNELING-MICROSCOPY; ENERGETICS;
D O I
10.1016/j.susc.2014.11.013
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
First-principles electronic-structure calculations have been performed to investigate energetics and electronic properties of boron (B) and nitrogen (N) defects in bilayer graphene. It is found that the formation energies for N-doped AB-stacked bilayers vary depending on dopant sites, whereas those for B-doped ones show almost site-independent behavior. From results of energy-band structure, B-doped and N-doped bilayer graphenes exhibit p-type and n-type electronic properties, respectively, with carriers on both two layers. It is also found that the boron and the nitrogen defects are observable in scanning tunneling microscopy (STM) images, while AA- and AB-stacking patterns of doped bilayer graphene exhibit similar STM images. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:57 / 61
页数:5
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