Infrared spectroscopic ellipsometry and atomic force microscopy study of plasma polymerized hexamethyldisiloxane layers post-treated by NH3 plasma

被引:14
作者
Tsankov, D [1 ]
Radeva, E
Hinrichs, K
Röseler, A
Korte, EH
机构
[1] Bulgarian Acad Sci, Inst Organ Chem, BG-1113 Sofia, Bulgaria
[2] Bulgarian Acad Sci, Inst Solid State Phys, BG-1784 Sofia, Bulgaria
[3] Inst Spectrochem & Appl Spectroscopy, Dept Berlin, D-12489 Berlin, Germany
关键词
polymers; plasma processing and deposition; ellipsometry; atomic force microscopy (AFM);
D O I
10.1016/j.tsf.2004.07.074
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hexamethyldisiloxane polymer layers obtained at low frequency glow discharge were post-treated by ammonia vapours under the same plasma conditions. Infrared spectroscopic ellipsometry and atomic force microscopy studies were carried out with the aim to elucidate the structural and morphological changes accompanying this modification. The infrared ellipsometry combined with best-fit calculations was used to evaluate the optical constants of the polymer film before and after the treatment, and thus to provide data for the vibrational band analysis. No additional modified layer due to the plasma treatment was detected, but a newly emerged weak band at 1562 cm(-1) was observed in the ellipsometric spectra of the ammonia-treated sample, which was ascribed to N-H deformation in amines. The surface morphology was imaged by atomic force microscopy. The data revealed that the NH3 treatment had caused distinct microstructural modification on the top layer surface. The size of the nodule aggregates was largely reduced and this contributed to-a much better developed top surface. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:174 / 180
页数:7
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