The effect of substrate position on the microstructure and mechanical properties of SiC coatings on carbon/carbon composites

In this work, silicon carbide (SiC) coatings were produced on carbon/carbon composites using a chemical vapour deposition (CVD) method. During deposition, the temperature was fixed at 1200 C and the coatings were produced by placing substrates at three different positions (340, 380 and 420 mm from the inlet) in the CVD reactor. The effect of substrate position on the microstructure and mechanical properties of the SiC coatings were experimentally investigated. The phase composition, surface morphology, defects and microstructure were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Raman Spectroscopy. The hardness and Young's modulus were measured using a nano-indentation method while fracture toughness was evaluated by micro-indentation. It was found that the deposition rate decreased linearly as substrate position moved far from the reactor inlet. In all coatings, only p-sic phase was observed with a high density of stacking faults. It was found that the substrate position in the CVD reactor has a significant effect on the microstructure, grain size and crystallinity of the coating. At 340 and 420 mm substrate positions, a well-developed faceted microstructure with high crystallinity was observed while at 380 mm substrate position, the coating having lenticular-like fine grains with low crystallinity was obtained. The hardness values obtained from the top surface of the coatings are found to be higher than those from the cross-section, although the Young's modulus data (measured from the top surface and cross-section) were observed to be similar. At 380 mm substrate position, hardness, Young's modulus and fracture toughness were found to be the lowest compared to that of the coatings produced at 340 and 420 mm substrate positions. It is concluded that the SiC coatings with better mechanical properties can be produced by adjusting the substrate position in the CVD reactor. (C) 2011 Elsevier B.V. All rights reserved.