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Coupled mesoscale - Continuum simulations of copper electrodeposition in a trench
被引:40
作者:
Drews, TO
Webb, EG
Ma, DL
Alameda, J
Braatz, RD
Alkire, RC
[1
]
机构:
[1] Univ Illinois, Dept Chem & Biomol Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Natl Ctr Supercomp Applicat, Urbana, IL 61801 USA
关键词:
multiscale simulations;
interconnect;
copper electrodeposition;
D O I:
10.1002/aic.10021
中图分类号:
TQ [化学工业];
学科分类号:
0817 ;
摘要:
Copper electrodeposition in submicron trenches involves phenomena that span many orders of magnitude in time and length scales. In the present work, two codes that simulate electrochemical phenomena on different time and length scales were externally linked. A Monte Carlo code simulated surface phenomena in order to resolve surface roughness evolution and trench in-fill. A 2-D finite difference code simulated transport phenomena in the diffusion boundary layer outside the trench. The continuum code passed fluxes to the Monte Carlo code, which passed back a concentration to the continuum code. A numerical instability that arises in the multiscale linked code was suppressed by filtering the concentration data passed from the Monte Carlo code to the finite difference code. The resulting simulation results were self-consistent for a sufficiently small amount of filtering. (C) 2004 American Institute of Chemical Engineers
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页码:226 / 240
页数:15
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