Impacts of Random Telegraph Noise (RTN) on Digital Circuits

被引:57
作者
Luo, Mulong [1 ]
Wang, Runsheng [1 ]
Guo, Shaofeng [1 ]
Wang, Jing [1 ]
Zou, Jibin [1 ]
Huang, Ru [1 ]
机构
[1] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
基金
中国国家自然科学基金;
关键词
Bit error rate (BER); dynamic variability; failure probability; Monte Carlo simulation; oxide trap; random telegraph noise (RTN); ring oscillator; signal integrity; SRAM;
D O I
10.1109/TED.2014.2368191
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Random telegraph noise (RTN) is one of the important dynamic variation sources in ultrascaled MOSFETs. In this paper, the recently focused ac trap effects of RTN in digital circuits and their impacts on circuit performance are systematically investigated. Instead of trap occupancy probability under dc bias condition (p(dc)), which is traditionally used for RTN characterization, ac trap occupancy probability (p(ac)), i.e., the effective percentage of time trap being occupied under ac bias condition, is proposed and evaluated analytically to investigate the dynamic trapping/detrapping behavior of RTN. A simulation approach that fully integrates the dynamic properties of ac trap effects is presented for accurate simulation of RTN in digital circuits. The impacts of RTN on digital circuit performances, e.g., failure probabilities of SRAM cells and jitters of ring oscillators, are then evaluated by the simulations and verified against predictions based on p(ac). The results show that degradations are highly workload dependent and that p(ac) is critical in accurately evaluating the RTN-induced performance degradation and variability. The results are helpful for robust and resilient circuit design.
引用
收藏
页码:1725 / 1732
页数:8
相关论文
共 32 条
  • [1] Aadithya K, 2011, DES AUT CON, P292
  • [2] [Anonymous], 2012, P S VLSI TECHN VLSI, DOI DOI 10.1109/VLSIT.2012.6242500
  • [3] [Anonymous], 2013, P IEEE INT EL DEV M, DOI [10.1109/IEDM.2013.6724745, DOI 10.1109/IEDM.2013.6724745]
  • [4] [Anonymous], 1 COURSE STOCHASTIC
  • [5] Chen J., 2013, 2013 Symposium on VLSI Technology, pT184
  • [6] Statistical Characterization and Modeling of the Temporal Evolutions of ΔVt Distribution in NBTI Recovery in Nanometer MOSFETs
    Chiu, Jung-Piao
    Liu, Yu-Heng
    Hsieh, Hung-Da
    Li, Chi-Wei
    Chen, Min-Cheng
    Wang, Tahui
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2013, 60 (03) : 978 - 984
  • [7] Fan ML, 2012, 2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)
  • [8] Impact of Single Charged Gate Oxide Defects on the Performance and Scaling of Nanoscaled FETs
    Franco, J.
    Kaczer, B.
    Toledano-Luque, M.
    Roussel, Ph J.
    Mitard, J.
    Ragnarsson, L. -A.
    Witters, L.
    Chiarella, T.
    Togo, M.
    Horiguchi, N.
    Groeseneken, G.
    Bukhori, M. F.
    Grasser, T.
    Asenov, A.
    [J]. 2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2012,
  • [9] Grasser T., 2014, IEEE Proc. Int. Rel. Phys. Symp. (IRPS), p4A.5.1, DOI DOI 10.1109/IRPS.2014.6860643
  • [10] Stochastic charge trapping in oxides: From random telegraph noise to bias temperature instabilities
    Grasser, Tibor
    [J]. MICROELECTRONICS RELIABILITY, 2012, 52 (01) : 39 - 70