Fundamental drift of parameters in chalcogenide phase change memory

被引:144
作者
Karpov, I. V. [2 ]
Mitra, M. [2 ]
Kau, D. [2 ]
Spadini, G. [2 ]
Kryukov, Y. A. [1 ]
Karpov, V. G. [1 ]
机构
[1] Univ Toledo, Dept Phys & Astron, Toledo, OH 43606 USA
[2] Intel Corp, Santa Clara, CA 95052 USA
关键词
D O I
10.1063/1.2825650
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present the data on temporal (t) drift of parameters in chalcogenide phase change memory that significantly complement the earlier published results. The threshold voltage V-th and the amorphous state resistance R are shown to drift as Delta V-th proportional to v ln t and R proportional to t(alpha) in broad intervals spanning up to nine decades in time; the drift coefficient v depends on glass parameters and temperature, but does not depend on device thickness. We have demonstrated that drift saturates at long enough times that can be shorten with temperature increase. All available data on drift dynamics are fully consistent with the classical double-well-potential model, which gives simple analytical expressions for the observed temporal dependencies including numerical parameters. (C) 2007 American Institute of Physics.
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页数:6
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