Influence of substrate treatment on self-organized pattern formation by Langmuir-Blodgett transfer

被引：14
|
作者：
Hirtz, Michael [1 ,2 ]
Fuchs, Harald [1 ,2 ]
Chi, Lifeng [1 ,2 ]
机构：
[1] Univ Munster, Inst Phys, D-48149 Munster, Germany
[2] CeNTech, D-48149 Munster, Germany
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2008年 / 112卷 / 03期
关键词：
D O I：
10.1021/jp0767664
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Mesoscopic stripe patterns can be obtained by Langmuir-Blodgett (LB) transfer of L-alpha-dipalmitoylphosphatidylcholine (DPPC) onto solid substrates. In order to investigate the influence of substrates on the pattern formation, silicon slides treated by different cleaning processes were taken as model systems. A shift in the transfer pressure range for patterning was observed between plasma- and RCA-treated silicon. This can be explained with a model of equivalent states and taking into account the influence of microscale water films on the substrates.
引用
收藏
页码：824 / 827
页数：4
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